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Metal Nitride Nanostructures by High-Energy Plasma Treatment for Electrolysis Water Splitting



主   办:材料科学与工程系
报告人:Prof. Hongjin FAN
时   间:6月28日(周二)下午15:00-18:00
地   点:澳门太阳娱乐网站官网1号楼210会议室
主持人:郭少军 研究员


报告简介:


Electrochemical water splitting to produce hydrogen and oxygen is an important process for many energy storage and conversion devices. It is essential to develop efficient, low-cost and earth-abundant, and durable electrocatalysts for both OER and HER. Bimetallic sulfides, nitrides, and phosphides are under intensive research and proven to be promising replacements of the precious noble metals. Metal nitrides are among the most suitable non-noble metal commercial catalysts, because the introduced N atoms strongly affect the electronic structure of the metal hosts by charge transfer processes and/or concomitant structural modification. In traditional synthesis methods, caustic and hazardous ammonia (NH3), long processing duration (1~4 h) and high reaction temperature are indispensable.
We have employed N2 RF plasma for fast and low-temperature synthesis of metal nitrides. Three examples will be given. 1) CoN nanowires array by converting the pre-synthesized Co3O4 nanowires with N2 plasma reaction in 1 min for OER. 2) NiMoN dendritic nanostructures by treating electrodeposited metal alloy for HER. 3) Converting commercial carbon cloth by plasma to be supercapacitive and Li-ion storage material. Our research provides a new methodology to synthesize metal nitrides for various applications such as catalysts, supercapacitors and batteries..
报告人:Dr. Fan is currently an associate professor at Nanyang Technological University (NTU). He received PhD from National University of Singapore in 2003, followed by postdoc at Max-Planck-Institute of Microstructure Physics, Germany and University of Cambridge. He joined in NTU since 2008. Dr. Fan’s research interests include optics and devices of semiconductor nanowires, energy conversion and storage applications of nanomaterials and perovskites (including solar water splitting, batteries and supercapacitors). He is particularly reputed for his work in application of atomic layer deposition (ALD) in energy research. Dr. Fan has published 160+ journal articles with an H-index 50. He is an editorial board member of Nanotechnology, Advisory board member of Advanced Science, Advanced Materials Interface, and Associate Editor of Materials Research Bulletin..

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